Use the process result
to calculate the next recipe
Process Control is an App that calculates the next run's process conditions from process results, targets, equipment manipulated variables and constraints. From R2R control to feedforward/feedback and multi-zone Profile Control, everything can be configured and validated in the same structure.
From mean-value correction to wafer profile control
Build a control strategy matched to the equipment's manipulated variables and the process objective. Validate expected results in Studio, then connect it to production in Runtime.
Define the control objective and strategy
Define targets, control cadence, feedback/feedforward information and which manipulated variables to use.
Validate expected behavior before deployment
Check recipe changes, expected process results, constraints and exception cases in a Digital Twin first.
Keep control running in production
Review calculated values and application status in Runtime while updating models and operating criteria as the process changes.
R2R Process Control
Feed wafer-to-wafer or lot-to-lot results into the next run to reduce variation around the target.
Profile Control
On equipment with multi-zone actuators, manage within-wafer profile and WIWNU together using zone-level manipulated variables.
Feedforward + Feedback
Combine upstream results with current-process feedback to respond separately to incoming variation and equipment drift.
Constraint-aware Recipe
Calculate control values within executable recipe ranges while respecting equipment limits and process constraints.